Study of optical material anisotropy using scanning millimeter wave beam

Albertas Laurinavičius; Vadim Derkach; Tomas Anbinderis

doi:10.1117/12.815946

2 December 2008 Study of optical material anisotropy using scanning millimeter wave beam

Albertas Laurinavičius, Vadim Derkach, Tomas Anbinderis

Proceedings Volume 7142, Sixth International Conference on Advanced Optical Materials and Devices (AOMD-6); 71420C (2008) https://doi.org/10.1117/12.815946
Event: Sixth International Conference on Advanced Optical Materials and Devices, 2008, Riga, Latvia

Abstract

Millimeter wave bridge technique for non-destructive material homogeneity characterization is described. The idea of this technique is the local excitation of the millimeter waves in the testing material and the measurement of the transmitted (reflected) wave amplitude and phase in different places of it, i.e. the material plate is scanned by the beam of the millimeter waves. Same results of the homogeneity measurements for dielectric wafers according to dielectric constant anisotropy are presented. The measurement technique sensitivity is discussed.

Citation Download Citation

Albertas Laurinavičius, Vadim Derkach, and Tomas Anbinderis "Study of optical material anisotropy using scanning millimeter wave beam", Proc. SPIE 7142, Sixth International Conference on Advanced Optical Materials and Devices (AOMD-6), 71420C (2 December 2008); https://doi.org/10.1117/12.815946

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