Development of MOEMS technology in maskless lithography

David Smith; Dieter Klenk

doi:10.1117/12.809549

13 February 2009 Development of MOEMS technology in maskless lithography

David Smith, Dieter Klenk

Proceedings Volume 7210, Emerging Digital Micromirror Device Based Systems and Applications; 72100K (2009) https://doi.org/10.1117/12.809549
Event: SPIE MOEMS-MEMS: Micro- and Nanofabrication, 2009, San Jose, California, United States

Abstract

Micro-opto-electro-mechanical-systems (MOEMS) have proven to be a facilitating technology in the lithography industry. Recently, there have been significant advancements in digital micromirror device (DMD) based maskless lithography. These advancements have been in the areas of throughput, resolution, accuracy, and cost reduction. This progression in digital micromirror evolution provides considerable opportunities to displace existing lithographic techniques. Precise control of the individual mircormirrors, including scrolling, and full utilization of the FPGA, have allowed DMD-based lithography systems to reach new levels of throughput and repeatability, while reducing production and warranty costs. Throughput levels have far surpassed scanning laser techniques. Chip level cooling technologies allow for higher incident power to be reliably distributed over larger areas of the substrate. Resolution roadmaps are in place to migrate from the current 2400dpi (11μm) to 4800dpi (5.3μm). Without the constraints of mask requirements, mask alignment, storage, and defect analysis are not required, thus increasing accuracy and reducing cost. This contribution will examine the advancements in and benefits of DMD based maskless lithography.

Citation Download Citation

David Smith and Dieter Klenk "Development of MOEMS technology in maskless lithography", Proc. SPIE 7210, Emerging Digital Micromirror Device Based Systems and Applications, 72100K (13 February 2009); https://doi.org/10.1117/12.809549

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