Paper
19 February 2009 Ferroelectric field effect transistor with a double-gate structure on AlGaN/GaN heterostructures
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Abstract
The ferroelectric effect has been demonstrated on an AlGaN/GaN heterostructure field effect transistor using a Pb(Zr0.52Ti0.48)O3 layer deposited by radio-frequency magnetron sputtering. The device with a metal-ferroelectric-metal-semiconductor (MFMS) structure was fabricated with a Schottky contact placed between ferroelectric PZT and AlGaN/GaN 2-dimensional electron gas (2DEG) channel. The Schottky contact performs as a bottom electrode of the ferroelectric PZT and also as a barrier layer to prevent interaction at the interface between PZT and GaN. X-ray diffraction revealed the formation of (111)-oriented perovskite phase PZT on gate patterned AlGaN/GaN heterostructures. Transfer characteristics of the double-gate ferroelectric field effect transistor was determined by measuring its source-drain current as the gate bias applied on the top electrode was swept from -15 V to 15 V and then back to -15 V with a voltage step of 0.1 V. Ferroelectric behavior was observed in the plot of source-drain current versus gate voltage that showed a large counterclockwise hysteresis with a 50 % current modulation at zero gate bias.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bo Xiao, Jinqiao Xie, Vitaliy Avrutin, Qian Fan, Mo Wu, and Hadis Morkoç "Ferroelectric field effect transistor with a double-gate structure on AlGaN/GaN heterostructures", Proc. SPIE 7216, Gallium Nitride Materials and Devices IV, 72162M (19 February 2009); https://doi.org/10.1117/12.811671
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Cited by 3 scholarly publications.
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KEYWORDS
Ferroelectric materials

Field effect transistors

Electrodes

Heterojunctions

Gallium nitride

Modulation

Semiconductors

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