Evaluation at the intermediate focus for EUV light source

Takashi Suganuma; Georg Soumagne; Masato Moriya; Tamotsu Abe; Akira Sumitani; Akira Endo

doi:10.1117/12.813494

18 March 2009 Evaluation at the intermediate focus for EUV light source

Takashi Suganuma, Georg Soumagne, Masato Moriya, Tamotsu Abe, Akira Sumitani, Akira Endo

Proceedings Volume 7271, Alternative Lithographic Technologies; 727133 (2009) https://doi.org/10.1117/12.813494
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

We are developing a CO₂ laser driven Sn plasma light source for HVM EUVL. This source enables cost-effective high-conversion efficiency (CE >4%) and EUV power scaling. To evaluate light source characteristics we developed a metrology tool for the EUV and for the out of band (DUV, IR) wavelength region. The EUV plasma light source emits radiation ranging from the EUV to the IR. To evaluate a particular wavelength region, spectral purity filters are used to select the region of interest. For the in-band EUV emission the power, the energy stability and the radiation profile are measured. The power is measured with an attenuating filter and a powermeter. The energy stability is measured with a filterd X-ray diode. The radiation profile is measured with a phosphor plate and a VIS-CCD camera. For the out of band emission, the radiated power is measured with an attenuating filter and a powermeter. The out of band region includes the CO₂ laser which is partly scattered by the plasma and reflected towards the IF and needs therefore to be included into the measurement.

Citation Download Citation

Takashi Suganuma, Georg Soumagne, Masato Moriya, Tamotsu Abe, Akira Sumitani, and Akira Endo "Evaluation at the intermediate focus for EUV light source", Proc. SPIE 7271, Alternative Lithographic Technologies, 727133 (18 March 2009); https://doi.org/10.1117/12.813494

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