Extreme ultraviolet holographic lithography with a table-top laser

A. Isoyan; F. Jiang; Y.-C. Cheng; P. Wachulak; L. Urbanski; J. Rocca; C. Menoni; M. Marconi; F. Cerrina

doi:10.1117/12.814678

18 March 2009 Extreme ultraviolet holographic lithography with a table-top laser

A. Isoyan, F. Jiang, Y.-C. Cheng, P. Wachulak, L. Urbanski, J. Rocca, C. Menoni, M. Marconi, F. Cerrina

Proceedings Volume 7271, Alternative Lithographic Technologies; 72713O (2009) https://doi.org/10.1117/12.814678
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

We report the demonstration of Extreme Ultraviolet Holographic Lithography - EUV-HL - using a compact table top extreme ultraviolet laser. The image of the computer-generated hologram (CGH) of a test pattern was projected on the surface of a sample coated with a high resolution photoresist. Features with a 140 nm pixel size were printed using for the reconstruction a highly coherent table top 46.9 nm extreme ultraviolet laser. We have demonstrated that the combination of a coherent EUV source with a nanofabricated CGH template allows for the extension of nanolithography in an extremely simple set up that requires no optics. The reconstructed image of CGH was digitized with an atomic force microscope, yielding to reconstructions that are in excellent agreement with the numerical predictions.

Citation Download Citation

A. Isoyan, F. Jiang, Y.-C. Cheng, P. Wachulak, L. Urbanski, J. Rocca, C. Menoni, M. Marconi, and F. Cerrina "Extreme ultraviolet holographic lithography with a table-top laser", Proc. SPIE 7271, Alternative Lithographic Technologies, 72713O (18 March 2009); https://doi.org/10.1117/12.814678

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