Proximity-effect induced limitations on the density of electron-beam patterned planar photonic nanostructures

R. Wüest

doi:10.1117/12.820562

12 May 2009 Proximity-effect induced limitations on the density of electron-beam patterned planar photonic nanostructures

R. Wüest

Author Affiliations +

Proceedings Volume 7353, Metamaterials IV; 735310 (2009) https://doi.org/10.1117/12.820562
Event: SPIE Optics + Optoelectronics, 2009, Prague, Czech Republic

Abstract

Patterning of deeply subwavelength artificial nanomaterials (photonic crystals, plasmonic metamaterials) for the visible or near-infrared optical spectrum is a challenging task. Electron-beam lithography is often the method of choice thanks to its combination of flexibility, accuracy and availability in many research laboratories. We present an analytical model for large and dense arrays of photonic nanostructures which allows to predict the maximum fill ratio (radius divided by nearest neighbor distance) before the onset of resist shrinkage between the individual elements. The model includes geometrical parameters of the design (lattice constant, lattice symmetry), resist properties (resist contrast) and proximity parameters (beam broadening, backscatter range, backscatter efficiency). It is shown that the resist contrast has a significant impact on the achievable maximum fill ratio even for large nearest neighbor distances and that the beam broadening, i.e. the quality of the EBL equipment, is of paramount importance. The background energy level which is determined by the backscatter efficiency and the lattice symmetry is shown to have a weaker influence on the maximum fill ratio. The derived model can be used as a guideline in the project planning stage to predict achievable fill ratios at a planned lattice constant and consequently an assessment whether a desired functionality at a certain wavelength is possible.

Citation Download Citation

R. Wüest "Proximity-effect induced limitations on the density of electron-beam patterned planar photonic nanostructures", Proc. SPIE 7353, Metamaterials IV, 735310 (12 May 2009); https://doi.org/10.1117/12.820562

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
10 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Backscatter

Electrons

Electron beam lithography

Lithography

Photoresist processing

Photonic crystals

Radium

Show All Keywords

Keywords/Phrases

Search In:

Publication Years