Using metrology capabilities of mask inspection equipment for optimizing total lithography performance

Shuichi Tamamushi; Noriyuki Takamatsu

doi:10.1117/12.833513

29 September 2009 Using metrology capabilities of mask inspection equipment for optimizing total lithography performance

Shuichi Tamamushi, Noriyuki Takamatsu

Author Affiliations +

Proceedings Volume 7488, Photomask Technology 2009; 74880C (2009) https://doi.org/10.1117/12.833513
Event: SPIE Photomask Technology, 2009, Monterey, California, United States

Abstract

The demand for aggressive image placement accuracy and CD uniformity for each generation is being increasingly accelerated by DPT deployment. The method of the correction with the scanner is in effect devised by obtaining the CD and IP maps of each mask after the mask pattern is drawn. We are developing a technology that generates CD and IP maps for each mask from the image data of inspection equipment with the ultimate goal of "in-die overlay improvement" optimizing scanner as well as writer performances. We evaluated the positional measurement function by using NPI inspection system with the evaluation mask.

Citation Download Citation

Shuichi Tamamushi and Noriyuki Takamatsu "Using metrology capabilities of mask inspection equipment for optimizing total lithography performance", Proc. SPIE 7488, Photomask Technology 2009, 74880C (29 September 2009); https://doi.org/10.1117/12.833513

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available