Novel EUV mask inspection tool with 199-nm laser source and high-resolution optics

Nobutaka Kikuiri; Masatoshi Hirono; Ryoichi Hirano; Tsuyoshi Amano; Osamu Suga; Hiroyuki Shigemura; Hideaki Hashimoto; Kenichi Takahara; Kinya Usuda

doi:10.1117/12.829747

29 September 2009 Novel EUV mask inspection tool with 199-nm laser source and high-resolution optics

Nobutaka Kikuiri, Masatoshi Hirono, Ryoichi Hirano, Tsuyoshi Amano, Osamu Suga, Hiroyuki Shigemura, Hideaki Hashimoto, Kenichi Takahara, Kinya Usuda

Author Affiliations +

Proceedings Volume 7488, Photomask Technology 2009; 74882O (2009) https://doi.org/10.1117/12.829747
Event: SPIE Photomask Technology, 2009, Monterey, California, United States

Abstract

A novel EUV mask inspection tool with 199nm laser source and super-resolution technique has been developed. This tool is based on NPI-5000PLUS, which is a photo-mask inspection tool for hp2X nm node and beyond. In order to implement EUV mask inspection with only a short time for mask set-up, reflected illumination type alignment optics to guide alignment mark and adjust mask coordinate with visible illumination light are equipped. Moreover, to inspect EUV masks for hp2X nm and beyond, the image detection optics with the novel polarized illumination technique is incorporated in this tool. Image contrast enhancement was confirmed by experiments and simulations.

Citation Download Citation

Nobutaka Kikuiri, Masatoshi Hirono, Ryoichi Hirano, Tsuyoshi Amano, Osamu Suga, Hiroyuki Shigemura, Hideaki Hashimoto, Kenichi Takahara, and Kinya Usuda "Novel EUV mask inspection tool with 199-nm laser source and high-resolution optics", Proc. SPIE 7488, Photomask Technology 2009, 74882O (29 September 2009); https://doi.org/10.1117/12.829747

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