Damage and degradation of optics and sensors under intense EUV radiation from a table-top laser produced plasma source

Frank Barkusky; Armin Bayer; Bernhard Flöter; Christian Peth; Klaus Mann

doi:10.1117/12.837357

31 December 2009 Damage and degradation of optics and sensors under intense EUV radiation from a table-top laser produced plasma source

Frank Barkusky, Armin Bayer, Bernhard Flöter, Christian Peth, Klaus Mann

Author Affiliations +

Proceedings Volume 7504, Laser-Induced Damage in Optical Materials: 2009; 75041J (2009) https://doi.org/10.1117/12.837357
Event: Laser Damage Symposium XLI: Annual Symposium on Optical Materials for High Power Lasers, 2009, Boulder, Colorado, United States

Abstract

In recent years, technological developments in the area of extreme ultraviolet lithography (EUVL) have experienced great improvements. Currently, the application of EUV radiation apart from microlithography comes more and more into focus. Main goal of our research is to utilize the unique interaction between soft x-ray radiation and matter for probing, modifying, and structuring solid surfaces. In this contribution we present a setup capable of generating and focusing EUV radiation. It consists of a table-top laser-produced plasma source. In order to obtain a small focal spot resulting in high EUV fluence, a modified Schwarzschild objective consisting of two spherical mirrors with Mo/Si multilayer coatings is adapted to this source, simultaneously blocking unwanted out-of-band radiation. By demagnified (10x) imaging of the plasma an EUV spot of 5 μm diameter with a maximum energy density of ~7.4 J/cm² is generated (pulse length 8.8 ns). We present first applications of this integrated source and optics system, demonstrating its potential for high-resolution modification and structuring of solid surfaces. As an example, etch rates for PMMA, PC and PTFE depending on EUV fluences were determined, indicating a linear etch behavior for lower energy densities. In order to investigate damage tests on EUV sensors and optics, 1-on-1 damage tests were performed on grazing incidence gold mirrors, Mo/Si multilayer mirrors and mirror substrates. To our knowledge, this is the first time that such experiments using nanosecond EUV-pulses were carried out.

Citation Download Citation

Frank Barkusky, Armin Bayer, Bernhard Flöter, Christian Peth, and Klaus Mann "Damage and degradation of optics and sensors under intense EUV radiation from a table-top laser produced plasma source", Proc. SPIE 7504, Laser-Induced Damage in Optical Materials: 2009, 75041J (31 December 2009); https://doi.org/10.1117/12.837357

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
10 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Extreme ultraviolet

Mirrors

Gold

Etching

Plasma

Multilayers

Polymethylmethacrylate

Show All Keywords

Keywords/Phrases

Search In:

Publication Years