Nanophotonic fabrication in sub-nm scale

Takashi Yatsui; Motoichi Ohtsu

doi:10.1117/12.846328

26 February 2010 Nanophotonic fabrication in sub-nm scale

Takashi Yatsui, Motoichi Ohtsu

Proceedings Volume 7586, Synthesis and Photonics of Nanoscale Materials VII; 75860D (2010) https://doi.org/10.1117/12.846328
Event: SPIE LASE, 2010, San Francisco, California, United States

Abstract

Nanophotonics, a novel optical technology, utilizes the local interaction between nanometric particles via optical near fields. The optical near fields are the elementary surface excitations on nanometric particles. Of the variety of qualitative innovations in optical technology realized by nanophotonics, this talk focuses on fabrication. A realization of an ultra-flat silica surface with angstrom-scale average roughness using noadiabatic optical near-field etching and repairing are demonstrated and its origin is discussed.

Citation Download Citation

Takashi Yatsui and Motoichi Ohtsu "Nanophotonic fabrication in sub-nm scale", Proc. SPIE 7586, Synthesis and Photonics of Nanoscale Materials VII, 75860D (26 February 2010); https://doi.org/10.1117/12.846328

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