Modeling of atomic and plasmas processes in the LPP and LA-DPP EUV source

Akira Sasaki; Katsunobu Nishihara; Atsushi Sunahara; Hiroyuki Furukawa; Takeshi Nishikawa; Fumihiro Koike

doi:10.1117/12.846467

22 March 2010 Modeling of atomic and plasmas processes in the LPP and LA-DPP EUV source

Akira Sasaki, Katsunobu Nishihara, Atsushi Sunahara, Hiroyuki Furukawa, Takeshi Nishikawa, Fumihiro Koike

Proceedings Volume 7636, Extreme Ultraviolet (EUV) Lithography; 76363D (2010) https://doi.org/10.1117/12.846467
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

We show an atomic model of Sn for the EUV sources. We show an improvement of the model in terms of the selection of energy levels and correction of the wavelength of the emission lines including resonance and satellite lines of combined 4d-4f and 4p-4d transition arrays. Calculated spectrum agrees well with experiments, showing that the present model is useful both for theoretical investigation of the optimum conditions the EUV sources, and for the analysis of experimental spectrum. A modeling method to estimate the initial spatial profile of the discharge path for the analysis of laser-assisted discharge pumped plasma sources is also proposed.

Citation Download Citation

Akira Sasaki, Katsunobu Nishihara, Atsushi Sunahara, Hiroyuki Furukawa, Takeshi Nishikawa, and Fumihiro Koike "Modeling of atomic and plasmas processes in the LPP and LA-DPP EUV source", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76363D (22 March 2010); https://doi.org/10.1117/12.846467

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