MAPPER: high-throughput maskless lithography

M. J. Wieland; G. de Boer; G. F. ten Berge; M. van Kervinck; R. Jager; J. J. M. Peijster; E. Slot; S. W. H. K. Steenbrink; T. F. Teepen; B. J. Kampherbeek

doi:10.1117/12.849480

1 April 2010 MAPPER: high-throughput maskless lithography

M. J. Wieland, G. de Boer, G. F. ten Berge, M. van Kervinck, R. Jager, J. J. M. Peijster, E. Slot, S. W. H. K. Steenbrink, T. F. Teepen, B. J. Kampherbeek

Author Affiliations +

Proceedings Volume 7637, Alternative Lithographic Technologies II; 76370F (2010) https://doi.org/10.1117/12.849480
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

MAPPER Lithography is developing a maskless lithography technology based on massively-parallel electron-beam writing with high speed optical data transport for switching the electron beams. In this way optical columns can be made with a throughput of 10-20 wafers per hour. By clustering several of these systems together high throughputs can be realized in a small footprint. This enables a highly cost-competitive alternative to double patterning and EUV alternatives^[1]. In 2009 MAPPER shipped two systems one to TSMC and one to CEA-Leti. Both systems will be used to verify the applicability of MAPPER's technology for CMOS manufacturing. This paper presents a status update on the development of the MAPPER system over the past year. First an overview will be presented how to scale the current system to a 10 wph machine which can consequently be used in a cluster configuration to enable 100 wph throughputs. Then the results of today's (pre-) alpha systems with 300 mm wafer capability are presented from the machines at MAPPER, TSMC and CEA-Leti.

Citation Download Citation

M. J. Wieland, G. de Boer, G. F. ten Berge, M. van Kervinck, R. Jager, J. J. M. Peijster, E. Slot, S. W. H. K. Steenbrink, T. F. Teepen, and B. J. Kampherbeek "MAPPER: high-throughput maskless lithography", Proc. SPIE 7637, Alternative Lithographic Technologies II, 76370F (1 April 2010); https://doi.org/10.1117/12.849480

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available