High volume jet and flash imprint lithography for discrete track patterned media

Zhengmao Ye; Rick Ramos; Cynthia B. Brooks; Paul Hellebrekers; Scott Carden; Dwayne LaBrake

doi:10.1117/12.849226

2 April 2010 High volume jet and flash imprint lithography for discrete track patterned media

Zhengmao Ye, Rick Ramos, Cynthia B. Brooks, Paul Hellebrekers, Scott Carden, Dwayne LaBrake

Proceedings Volume 7637, Alternative Lithographic Technologies II; 76371A (2010) https://doi.org/10.1117/12.849226
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

The Jet and Flash Imprint Lithography (J-FIL) process uses drop dispensing of UV curable resists for high resolution patterning. Several applications, including patterned media, are better, and more economically served by a full substrate patterning process since the alignment requirements are minimal. Patterned media is particularly challenging because of the aggressive feature sizes necessary to achieve storage densities required for manufacturing beyond the current technology of perpendicular recording. In this paper, the key process steps for the application of J-FIL to pattern media fabrication are reviewed with special attention to the vapor adhesion layer and imprint performance at >300 disk per hour.

Citation Download Citation

Zhengmao Ye, Rick Ramos, Cynthia B. Brooks, Paul Hellebrekers, Scott Carden, and Dwayne LaBrake "High volume jet and flash imprint lithography for discrete track patterned media", Proc. SPIE 7637, Alternative Lithographic Technologies II, 76371A (2 April 2010); https://doi.org/10.1117/12.849226

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