Improved recipe quality control: from development to mass production

Yukari Nakata; Shunsuke Koshihara; Hiroki Kawada; Kyoungmo Yang; Junichi Kakuta; Akemi Kono

doi:10.1117/12.846320

1 April 2010 Improved recipe quality control: from development to mass production

Yukari Nakata, Shunsuke Koshihara, Hiroki Kawada, Kyoungmo Yang, Junichi Kakuta, Akemi Kono

Proceedings Volume 7638, Metrology, Inspection, and Process Control for Microlithography XXIV; 76382S (2010) https://doi.org/10.1117/12.846320
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

The Critical Dimension Scanning Electron Microscope (CD-SEM) performs automatic measurement according to the recipe conditions programmed in advance. Traditionally, recipe creation requires not only a knowledgeable engineer but also scheduled tool time with appropriate wafers from the production equipment. It will bring a negative impact significantly to overall productivity when CD-SEM is under heavy utilization for creating massive recipe. Besides, the errors from recipe caused could give an additional interruption for production running from assisting measurement and recipe optimization as well. In this paper, we introduce the new concept of a function, naming Average Template, toward improving offline based recipe correction. Average Template allows creating highly robust pattern recognition template against pattern variations as averaging the images which are saved during recipe running, and this new function has been evaluated to prove the benefit of its application in the mass production. DesignGauge (DG) has allowed reliable recipe creation. However, the functionality improvement for stable recipe optimization is effectuated without wafer through the Average Template. Both recipe creation and optimization in robustness are actualized as utilizing this new function in DG, so that tool can keep under production without any interruption.

Citation Download Citation

Yukari Nakata, Shunsuke Koshihara, Hiroki Kawada, Kyoungmo Yang, Junichi Kakuta, and Akemi Kono "Improved recipe quality control: from development to mass production", Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 76382S (1 April 2010); https://doi.org/10.1117/12.846320

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KEYWORDS

Image processing

Semiconducting wafers

Error analysis

Detection and tracking algorithms

Lithography

Pattern recognition

Metrology

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