Paper
30 March 2010 Study on acid diffusion length effect with PAG-blended system and anion-bounded polymer system
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Abstract
Fundamental studies on polymer bounded PAG and polymer - PAG blend type were carried out with the viewpoint of dissolution property, lithographic performance, and blur. These materials were prepared to be able to directly compare and to discuss the difference between blend and bounded PAG, with different PAG loading amount. Dissolution property revealed the clear difference of these materials tendency to the PAG loading amount variation. Lithographic performance difference corresponds to the dissolution property difference, and there found the strategy to improve lithographic performance with polymer bounded PAG type resist. Blur study suggests the advantage in polymer bounded PAG in resolution.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shinji Tarutani, Hideaki Tsubaki, Hidenori Takahashi, Takayuki Itou, Kentaro Matsunaga, Gousuke Shiraishi, and Toshiro Itani "Study on acid diffusion length effect with PAG-blended system and anion-bounded polymer system", Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 76391O (30 March 2010); https://doi.org/10.1117/12.846033
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Cited by 6 scholarly publications and 2 patents.
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KEYWORDS
Polymers

Diffusion

Lithography

Line width roughness

Semiconducting wafers

Polymer thin films

Extreme ultraviolet lithography

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