Paper
2 April 2010 OPC on a single desktop: a GPU-based OPC and verification tool for fabs and designers
Ilhami Torunoglu, Ahmet Karakas, Erich Elsen, Curtis Andrus, Brandon Bremen, Pururav Thoutireddy
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Abstract
A computational lithography solution addressing accuracy, speed and affordability requirements is presented. In particular, the cost of computational hardware should be affordable and that the speed and accuracy of the algorithm should be sufficient to complete a full-chip computation overnight. Given the issues associated with present tools, the presented solution uses graphic processors (GPUs) as well as CPUs as computation hardware to achieve a breakthrough improvement in speed and affordability. Scalability to large scale clusters has been addressed so that the solution can be simultaneously used by chip designers as well as manufacturers to provide consistency.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ilhami Torunoglu, Ahmet Karakas, Erich Elsen, Curtis Andrus, Brandon Bremen, and Pururav Thoutireddy "OPC on a single desktop: a GPU-based OPC and verification tool for fabs and designers", Proc. SPIE 7641, Design for Manufacturability through Design-Process Integration IV, 764114 (2 April 2010); https://doi.org/10.1117/12.846636
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CITATIONS
Cited by 6 scholarly publications.
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KEYWORDS
Photomasks

Optical proximity correction

Semiconducting wafers

3D modeling

Lithography

Algorithm development

Light sources

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