Paper
14 December 2010 Study of microstructural and optical properties of a-Si:H thin films
Stanislav Jurečka, Jarmila Müllerová
Author Affiliations +
Proceedings Volume 7746, 17th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics; 774615 (2010) https://doi.org/10.1117/12.880053
Event: 17th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 2010, Liptovsky Jan, Slovakia
Abstract
Undoped amorphous silicon thin films pasivated by hydrogen (a-Si:H) are important for a number of industrial and research applications, especially for optoelectronics, photovoltaics, optical communications, senzorics, laser technology and so on. We experimentally studied properties of the a-Si:H thin films prepared by the plasma-enhanced chemical vapour deposition (PECVD) method. Sample microstructure properties and the effect of the microstructure on optical properties of the a-Si:H thin films deposited by PECVD on glass were analysed. The spectral refractive index, extinction coefficient, and surface morphology were analysed for the series of a-Si:H samples prepared in different technological conditions from H diluted silane plasma. Surface morphology of studied samples was described by the atomic force microscopy (AFM) method. Optical properties of a-Si:H thin films were analysed by numerical optimization of the microstructural and dispersion model of optical parameters relative to the experimental spectral reflectance. The results show that at dilution between 20 and 30 the transition between amorphous and polycrystalline phase occurs. The sample becomes a mixture of amorphous and polycrystalline phase with nano-sized grains and voids with decreasing hydrogen concentration.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stanislav Jurečka and Jarmila Müllerová "Study of microstructural and optical properties of a-Si:H thin films", Proc. SPIE 7746, 17th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 774615 (14 December 2010); https://doi.org/10.1117/12.880053
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KEYWORDS
Optical properties

Reflectivity

Refractive index

Thin films

Hydrogen

Plasma enhanced chemical vapor deposition

Plasma

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