Applications Of A High-Speed, High-Resolution Metrology System

KarI L. Harris; Sakae Miyauchi; Takao Namae

doi:10.1117/12.940426

17 April 1987 Applications Of A High-Speed, High-Resolution Metrology System

KarI L. Harris, Sakae Miyauchi, Takao Namae

Proceedings Volume 0775, Integrated Circuit Metrology, Inspection, & Process Control; (1987) https://doi.org/10.1117/12.940426
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

It has been well established by previous work that high resolution electron-beam imaging is required to accurately measure dimensions near a micron and below. A brief overview of the applications for micrometrology system indicates that speed of operation or thruput is very important. A recently developed system is described which has been specifically designed for low voltage, high-speed micrometrology.

Citation Download Citation

KarI L. Harris, Sakae Miyauchi, and Takao Namae "Applications Of A High-Speed, High-Resolution Metrology System", Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); https://doi.org/10.1117/12.940426

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