Atomic layer epitaxy of TiO2/ZnO multilayer optics using ZnO buffer layer for water-window x-ray

Masaki Murata; Yuji Tanaka; Yasutaka Sanjo; Hiroshi Kumagai; Tsutomu Shinagawa; Masaya Chigane

doi:10.1117/12.874377

14 February 2011 Atomic layer epitaxy of TiO₂/ZnO multilayer optics using ZnO buffer layer for water-window x-ray

Masaki Murata, Yuji Tanaka, Yasutaka Sanjo, Hiroshi Kumagai, Tsutomu Shinagawa, Masaya Chigane

Proceedings Volume 7927, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV; 79270Q (2011) https://doi.org/10.1117/12.874377
Event: SPIE MOEMS-MEMS, 2011, San Francisco, California, United States

Abstract

A novel TiO₂/ZnO multilayer deposited by atomic layer epitaxy technique has been fabricated to achieve a high reflective mirror and an attosecond chirped mirror in soft-x-ray "water-window" (λ=2.332-4.368 nm) wavelengths region. The technique in this study is able to satisfy reguirements for atomic layer control through epitaxial growth using sequential surface reaction and self-limiting nature. In preliminary experimental studies, both rutile TiO₂ (200) and wurtzite ZnO (0001) thin films were grown epitaxially on the same sapphire (0001) substrates at 450°C and moreover a high reflectivity of 29.8% was obtained at around 2.734 nm and a grazing angle of 2θ=10°. The authors conducted the ALE experiment of TiO₂/ZnO multilayer using a ZnO buffer layer. As a result, the multilayer using a buffer layer was able to be grown epitaxially on not only sapphire (0001) but also Si (100). In addition, reflectivity of multilayer remained to be 24.6% even on Si (100) in contrast with that about 27.5% on sapphire (0001) at grazing angle of 2θ = 8°. Thus, the ZnO buffer layer becomes the key layer to fabricate the TiO₂/ZnO multilayer on various substrates. In the presentation, ALE of TiO₂/ZnO multilayer mirrors using buffer layer will be shown in detail.

Citation Download Citation

Masaki Murata, Yuji Tanaka, Yasutaka Sanjo, Hiroshi Kumagai, Tsutomu Shinagawa, and Masaya Chigane "Atomic layer epitaxy of TiO₂/ZnO multilayer optics using ZnO buffer layer for water-window x-ray", Proc. SPIE 7927, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV, 79270Q (14 February 2011); https://doi.org/10.1117/12.874377

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