Paper
2 February 1988 Millimeter Wave Monolithic GaAs Power FET Amplifiers
B. Kim, H. Q. Tserng, H. D. Shih
Author Affiliations +
Proceedings Volume 0795, Characterization of Very High Speed Semiconductor Devices and Integrated Circuits; (1988) https://doi.org/10.1117/12.940961
Event: Advances in Semiconductors and Semiconductor Structures, 1987, Bay Point, FL, United States
Abstract
Millimeter-wave monolithic GaAs power FETs with total gate widths of up to 400 pm and output powers up to 200 mW have been developed. These amplifiers were fabricated using sub-half-micrometer gate length FETs on MBE-grown epitaxial layers with n+ contact layers. A source overlay structure with via groundings has been used for the FET design. Power densities of 0.53 W/mm, 0.45 W/mm, and 0.25 W/mm were obtained at 34 GHz, 41 GHz, 54 GHz, respectively. Power-added efficiency of 33% was obtained at 35 GHz with 0.53 W/mm power density.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
B. Kim, H. Q. Tserng, and H. D. Shih "Millimeter Wave Monolithic GaAs Power FET Amplifiers", Proc. SPIE 0795, Characterization of Very High Speed Semiconductor Devices and Integrated Circuits, (2 February 1988); https://doi.org/10.1117/12.940961
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Cited by 22 scholarly publications.
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KEYWORDS
Amplifiers

Field effect transistors

Gallium arsenide

Integrated circuits

Semiconductors

Capacitors

Gold

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