Paper
7 January 2011 The preferential nucleation sites of self-assembled quantum dots with the influence of interfacial dislocation network
Shuai Zhou, Yumin Liu, Zhongyuan Yu
Author Affiliations +
Proceedings Volume 7987, Optoelectronic Materials and Devices V; 79870C (2011) https://doi.org/10.1117/12.888354
Event: Asia Communications and Photonics Conference and Exhibition, 2010, Shanghai, Shanghai, China
Abstract
The strain field and elastic energy due to interfacial misfit dislocation networks near the free surface have been calculated analytically. The result predicted the preferential nucleation sites of self-assembled quantum dots with the influence of dislocation networks. Compared with Green function method, our solution is simple, direct and can solve the problem completely.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shuai Zhou, Yumin Liu, and Zhongyuan Yu "The preferential nucleation sites of self-assembled quantum dots with the influence of interfacial dislocation network", Proc. SPIE 7987, Optoelectronic Materials and Devices V, 79870C (7 January 2011); https://doi.org/10.1117/12.888354
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Quantum dots

Germanium

Networks

Semiconductors

Interfaces

Nanolithography

Optoelectronics

Back to Top