Paper
5 May 2011 Smart ultrasonic sensors systems: investigations on aluminum nitride thin films for the excitation of high frequency ultrasound
Susan Walter, Thomas Herzog, Henning Heuer, Hagen Bartzsch, Daniel Gloess
Author Affiliations +
Proceedings Volume 8066, Smart Sensors, Actuators, and MEMS V; 806607 (2011) https://doi.org/10.1117/12.886852
Event: SPIE Microtechnologies, 2011, Prague, Czech Republic
Abstract
Aluminum nitride is a promising material for the use as a piezoelectric sensor material for resonance frequencies higher than 50 MHz and contains the potential for high frequency phased array application in the future. This work represents the fundamental research on piezoelectric aluminum nitride films with a thickness of up to 10 μm based on a double ring magnetron sputtering process. The deposition process of the aluminum nitride thin film layers on silicon substrates was investigated and optimized regarding their piezoelectric behavior. Therefore a specific test setup and a measuring station were created to characterize the sensors. Large single element transducers were deposited on silicon substrates with aluminum electrodes, using different parameters for the magnetron sputter process, like pressure and bias voltage. Afterwards acoustical measurements were carried out in pulse echo mode up to 500 MHz and the piezoelectric charge constants (d33) were determined. As a result, two parameter sets were found for the sputtering process to obtain an excellent piezoelectric charge constant of about 7.2 pC/N maximum.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Susan Walter, Thomas Herzog, Henning Heuer, Hagen Bartzsch, and Daniel Gloess "Smart ultrasonic sensors systems: investigations on aluminum nitride thin films for the excitation of high frequency ultrasound", Proc. SPIE 8066, Smart Sensors, Actuators, and MEMS V, 806607 (5 May 2011); https://doi.org/10.1117/12.886852
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KEYWORDS
Sensors

Aluminum nitride

Electrodes

Thin films

Silicon

Sputter deposition

Ultrasonography

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