Ellipsometry As A Real-Time Deposition Monitor

R. L. Hall; W. H. Southwell; W. J. Gunning

doi:10.1117/12.967442

1 January 1987 Ellipsometry As A Real-Time Deposition Monitor

R. L. Hall, W. H. Southwell, W. J. Gunning

Proceedings Volume 0818, Current Developments in Optical Engineering II; (1987) https://doi.org/10.1117/12.967442
Event: 31st Annual Technical Symposium on Optical and Optoelectronic Applied Sciences and Engineering, 1987, San Diego, CA, United States

Abstract

The use of an ellipsometer as an in situ thin film deposition monitor is usually complicated by the calculations required to arrive at an estimate of the index and thickness values. In general, the ellipsometer parameters Φ and Δ are derived from the measured readings. The calculation for index and thickness from the (Φ and Δ values is by successive approximation and can require considerable time. Because of this, real-time control is not possible even for modest evaporation rates. The direct use of the Fourier coefficients of the signal from the ellipsometer analyzer can significantly increase the data acquisition rate. One quick way to analyze the data from the ellipsometer is to compare the numerical Fourier analysis of the ellipsometer signal with the expected values calculated prior to the deposition. Several commercial ellipsometers can provide such a signal for accurate layer thickness measurements, in near real-time, during the thin film coating process, thus, enabling computer control of multiple evaporation sources. Variations of the measured ellipsometer Fourier parameters can provide a great deal of information on the index, thickness, and inhomogeneity of the film during growth. A method for realizing the above is presented, along with examples of films grown using this technique.

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R. L. Hall, W. H. Southwell, and W. J. Gunning "Ellipsometry As A Real-Time Deposition Monitor", Proc. SPIE 0818, Current Developments in Optical Engineering II, (1 January 1987); https://doi.org/10.1117/12.967442

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KEYWORDS

Signal detection

Optical engineering

Ellipsometry

Polarization

Refractive index

Sensors

Thin films

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