High-numerical-aperture focused field measurement system based on a confocal microscopy

Zhehai Zhou; Qiaofeng Tan

doi:10.1117/12.916884

15 November 2011 High-numerical-aperture focused field measurement system based on a confocal microscopy

Zhehai Zhou, Qiaofeng Tan

Proceedings Volume 8321, Seventh International Symposium on Precision Engineering Measurements and Instrumentation; 832146 (2011) https://doi.org/10.1117/12.916884
Event: Seventh International Symposium on Precision Engineering Measurements and Instrumentation, 2011, Yunnan, China

Abstract

A high-numerical-aperture (NA) focused field measurement system based on a confocal microscopy is presented, and its basic structure and operation theory are introduced in details. In order to evaluate the reliability and efficiency of the measurement system, the focused field intensity distributions of several types of beams, including linearly polarized beams, radially polarized beams, azimuthally polarized beams and radially polarized vortex beams are measured while the NA of the focused objective lens is 0.90, and the Measured results agree with the calculated results. In addition, some methods are also proposed to improve the measurement accuracy at last.

Citation Download Citation

Zhehai Zhou and Qiaofeng Tan "High-numerical-aperture focused field measurement system based on a confocal microscopy", Proc. SPIE 8321, Seventh International Symposium on Precision Engineering Measurements and Instrumentation, 832146 (15 November 2011); https://doi.org/10.1117/12.916884

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KEYWORDS

Confocal microscopy

Polarization

Liquid crystals

Polarizers

Objectives

Reliability

Aluminum

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