A phase segregating polymer blend for 2xnm feature applications

Jin Li; Tatsuro Nagahara; Munirathna Padmanaban; John Sagan

doi:10.1117/12.916031

21 March 2012 A phase segregating polymer blend for 2xnm feature applications

Jin Li, Tatsuro Nagahara, Munirathna Padmanaban, John Sagan

Proceedings Volume 8323, Alternative Lithographic Technologies IV; 83231R (2012) https://doi.org/10.1117/12.916031
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

A phase segregating polymer blend comprising a SOD precursor polysilazane and an organic polymer PSαMS [poly(styrene-co-α-methyl styrene)] was studied. By utilizing similar approaches employed in DSA (directed self-assembly) such as patterned substrates, surface chemical modification etc and their combination, we achieved 2xnm spacer and airgap-like structure. Vertical phase separation and cylinder microdomains in the film of this blend can be straightforwardly observed by cross-section SEM (Scanning Electron Microscope) respectively. The airgap-like structure derived from cylinder microdomains was directly obtained on ArF resist pattern. Spacer derived from vertical phase separation was obtained on pretreated ArF resist pattern.

Citation Download Citation

Jin Li, Tatsuro Nagahara, Munirathna Padmanaban, and John Sagan "A phase segregating polymer blend for 2xnm feature applications", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83231R (21 March 2012); https://doi.org/10.1117/12.916031

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