Study on near-field scattering characteristic based on ray-tracing

Kaifeng Wu; Jing Ma; Hongxia Mao; Yanbing Dong

doi:10.1117/12.977637

15 October 2012 Study on near-field scattering characteristic based on ray-tracing

Kaifeng Wu, Jing Ma, Hongxia Mao, Yanbing Dong

Proceedings Volume 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment; 84172W (2012) https://doi.org/10.1117/12.977637
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China

Abstract

A new arithmetic is put forward for calculating near-field scattering, which based on ray-tracing. Detailedly, targets is modeled by elementary volume elements, each contains the spectrum scattering coefficients(BRDF). When the distance between the targets and the detector changes, the light source is simulated as a spot source or surface source. In ray tracing, KD-TREE is used and adopted the CUDA multithreading programming arithmetic, which enable to tackle huge quantities of rays in complex geometric environment. The test result proves the practicability of the method.

Citation Download Citation

Kaifeng Wu, Jing Ma, Hongxia Mao, and Yanbing Dong "Study on near-field scattering characteristic based on ray-tracing", Proc. SPIE 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 84172W (15 October 2012); https://doi.org/10.1117/12.977637

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KEYWORDS

Scattering

Ray tracing

Bidirectional reflectance transmission function

Light scattering

Near field

Target detection

Parallel processing

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