Paper
15 October 2012 Research on new stitching interferometric testing for CPP
Hao Yan, Chunlin Yang, Qikai Shi, Shenglin Wen, Jian Wang, Liming Yang
Author Affiliations +
Proceedings Volume 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment; 84173B (2012) https://doi.org/10.1117/12.2002561
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China
Abstract
The test of wavefront of large aperture continuous phase plate(CPP) is difficult to obtain by whole aperture once because of CPP’s characteristic such as large phase depth and large phase gradient,so sub-aperture stitching technique is often used to test the CPP’s wavefront in whole aperture.We analysed some problems in the traditional sub-aperture stitching test and put forward a new stitching model mathematically in order to improve the precision in CPP’s sub-aperture stitching test.We have found that this new model is available by a serial experiments.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hao Yan, Chunlin Yang, Qikai Shi, Shenglin Wen, Jian Wang, and Liming Yang "Research on new stitching interferometric testing for CPP", Proc. SPIE 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 84173B (15 October 2012); https://doi.org/10.1117/12.2002561
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Cited by 1 scholarly publication.
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KEYWORDS
Wavefronts

Data modeling

Mathematical modeling

Interferometry

Manufacturing

Optical testing

Error analysis

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