Optical measurement of the layer thickness of transparent materials

H. Dierke; R. Tutsch

doi:10.1117/12.923698

4 May 2012 Optical measurement of the layer thickness of transparent materials

H. Dierke, R. Tutsch

Proceedings Volume 8430, Optical Micro- and Nanometrology IV; 843008 (2012) https://doi.org/10.1117/12.923698
Event: SPIE Photonics Europe, 2012, Brussels, Belgium

Abstract

Surface metrology plays an important role in the field of product development and quality assurance, not only in micro systems technology. Here, nowadays increasingly materials are used that lead to systematic deviations if measured by conventional dimensional measuring techniques. One example are polymers like SU-8 that are used on the one hand as a photoresist for structuring of micro systems, on the other hand also as the material for forming micro structures themselves. The accurate measurement of the structural dimensions like e.g. the thickness of films made from transparent materials is a challenging task for conventional optical instruments. It has to be taken into account that usually instead of the geometrical thickness d the optical thickness nd (n: refractive index) is measured. In addition to that, measurement of these structures becomes even more difficult, if they consist of several materials with different behavior regarding the applied measuring technique. In this case, also the different material parameters like absorption, dispersion, etc. have to be considered.

Citation Download Citation

H. Dierke and R. Tutsch "Optical measurement of the layer thickness of transparent materials", Proc. SPIE 8430, Optical Micro- and Nanometrology IV, 843008 (4 May 2012); https://doi.org/10.1117/12.923698

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