Progress of multi-beam long trace-profiler development

Mikhail V. Gubarev; Daniel J. Merthe; Kiranmayee Kilaru; Thomas Kester; Ron Eng; Brian Ramsey; Wayne R. McKinney; Peter Z. Takacs; Valeriy V. Yashchuk

doi:10.1117/12.930056

15 October 2012 Progress of multi-beam long trace-profiler development

Mikhail V. Gubarev, Daniel J. Merthe, Kiranmayee Kilaru, Thomas Kester, Ron Eng, Brian Ramsey, Wayne R. McKinney, Peter Z. Takacs, Valeriy V. Yashchuk

Author Affiliations +

Proceedings Volume 8501, Advances in Metrology for X-Ray and EUV Optics IV; 85010B (2012) https://doi.org/10.1117/12.930056
Event: SPIE Optical Engineering + Applications, 2012, San Diego, California, United States

Abstract

The multi-beam long trace profiler (LTP) under development at NASA’s Marshall Space Flight Center^[1] is designed to increase the efficiency of metrology of replicated X-ray optics. The traditional LTP operates on a single laser beam that scans along the test surface to detect the slope errors. While capable of exceptional surface slope accuracy, the LTP single beam scanning has slow measuring speed. As metrology constitutes a significant fraction of the time spent in optics production, an increase in the efficiency of metrology helps in decreasing the cost of fabrication of the x-ray optics and in improving their quality. Metrology efficiency can be increased by replacing the single laser beam with multiple beams that can scan a section of the test surface at a single instance. The increase in speed with such a system would be almost proportional to the number of laser beams. A collaborative feasibility study has been made and specifications were fixed for a multi-beam long trace profiler. The progress made in the development of this metrology system is presented.

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Mikhail V. Gubarev, Daniel J. Merthe, Kiranmayee Kilaru, Thomas Kester, Ron Eng, Brian Ramsey, Wayne R. McKinney, Peter Z. Takacs, and Valeriy V. Yashchuk "Progress of multi-beam long trace-profiler development", Proc. SPIE 8501, Advances in Metrology for X-Ray and EUV Optics IV, 85010B (15 October 2012); https://doi.org/10.1117/12.930056

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