Paper
15 October 2012 NEGF analysis of double gate SiGe and GaAs tunnel FETs
Rahul Mishra, Bahniman Ghosh
Author Affiliations +
Proceedings Volume 8549, 16th International Workshop on Physics of Semiconductor Devices; 85490C (2012) https://doi.org/10.1117/12.927344
Event: 16th International Workshop on Physics of Semiconductor Devices, 2011, Kanpur, India
Abstract
In recent past extensive device simulation work has already been done on TFETs. Various ways have been suggested to model TFETs. In our paper we look at one such particular way to model these devices. The Non equilibrium green’s formalism has proved effective in modeling nano scale devices. We model complete SiGe and GaAs tunnel FET for the first time using the NEGF formalism, also taking acoustic phonon scattering into account. We analyze them on the grounds of I-V curve, Ion-Ioff ration and subthreshold slope. The poisson equation and the equilibrium statistical mechanical equation has been solved by providing the potential profile.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rahul Mishra and Bahniman Ghosh "NEGF analysis of double gate SiGe and GaAs tunnel FETs", Proc. SPIE 8549, 16th International Workshop on Physics of Semiconductor Devices, 85490C (15 October 2012); https://doi.org/10.1117/12.927344
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KEYWORDS
Gallium arsenide

Field effect transistors

Acoustics

Instrument modeling

Phonons

Scattering

Statistical analysis

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