Paper
4 February 2013 Fabrication and characterization of lateral polar GaN structures for second harmonic generation
Marc P. Hoffmann, Michael Gerhold, Ronny Kirste, Anthony Rice, Christer-Rajiv Akouala, Jinqiao Q. Xie, Seiji Mita, Ramon Collazo, Zlatko Sitar
Author Affiliations +
Abstract
The growth, fabrication, and properties of GaN/AlN/sapphire with periodically poled surface polarity for second harmonic generation are investigated. The periodic inversion of the surface polarity is achieved by the growth of a thin AlN buffer layer and subsequent partial removal by using either wet etching with potassium hydroxide (KOH) or reactive-ion etching (RIE). GaN growth on these substrates by MOCVD leads to Gapolar GaN on the AlN buffer and N-polar GaN on the bare sapphire. Using atomic force microscopy and scanning electron microscopy, it is demonstrated that a sufficient combination of H2 and NH3 surface treatment before the growth of the GaN layers removes surface defects introduced by RIE etching. Thus, films with comparable quality and properties independent of the etching technique could be grown. However, in contrast to RIE etching, the interfaces between the Ga-polar and N-polar GaN is rough if KOH etching is applied. Thus, it is concluded that MOCVD in combination with RIE etched AlN/sapphire substrates can be a versatile process to fabricate GaN with periodically poled surface polarity as desired for UV light generation via frequency doubling.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Marc P. Hoffmann, Michael Gerhold, Ronny Kirste, Anthony Rice, Christer-Rajiv Akouala, Jinqiao Q. Xie, Seiji Mita, Ramon Collazo, and Zlatko Sitar "Fabrication and characterization of lateral polar GaN structures for second harmonic generation", Proc. SPIE 8631, Quantum Sensing and Nanophotonic Devices X, 86311T (4 February 2013); https://doi.org/10.1117/12.2008827
Lens.org Logo
CITATIONS
Cited by 13 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Gallium nitride

Etching

Reactive ion etching

Aluminum nitride

Sapphire

Interfaces

Atomic force microscopy

RELATED CONTENT

Strain engineered high reflectivity DBRs in the deep UV
Proceedings of SPIE (February 26 2016)
GaN based LEDs with air voids prepared by laser scribing...
Proceedings of SPIE (February 06 2012)
Reduction in operating voltage of UV laser diode
Proceedings of SPIE (March 16 2010)
AlGaN layers grown on AlGaN buffer layer and GaN buffer...
Proceedings of SPIE (January 04 2008)
Growth of low defect AlGaN by lateral epitaxy over V...
Proceedings of SPIE (September 21 2006)

Back to Top