Paper
8 January 2013 High-resolution X-ray diffraction and electron microscopy study of porous GaAs substrates
Andrey A. Lomov, Jan Grym, Dusan Nohavica, Andrey S. Orehov, Alexander L. Vasiliev, Dmitri V. Novikov
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Proceedings Volume 8700, International Conference Micro- and Nano-Electronics 2012; 87000D (2013) https://doi.org/10.1117/12.2017023
Event: International Conference on Micro-and Nano-Electronics 2012, 2012, Zvenlgorod, Russian Federation
Abstract
We investigated structural perfection of porous gallium arsenide layers formed in GaAs (001). Different modes of electrochemical etching of n-type GaAs(001) substrates in fluoride-iodide aqueous electrolytes were used to form porous layers. Their structural properties were investigated by high resolution X-ray and synchrotron radiation diffraction and electron microscopy (SEM, TEM) techniques. It was shown that a single current pulse with a high magnitude forms a discontinuous porous layer with a smooth surface. Subsequent etching with a relatively low current density forms a homogeneous porous structure in the depth with approximately 30% porosity. The porous layer thickness can be varied from a few microns to several tens of microns depending on the etching time. The lattice parameter of porous GaAs layers along the surface normal is decreased by a factor of 1.5×10-4 compared to the GaAs substrate. This contraction is related to the formation of vacancy type structural defects as revealed by the measurement of x-ray diffuse scattering.
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Andrey A. Lomov, Jan Grym, Dusan Nohavica, Andrey S. Orehov, Alexander L. Vasiliev, and Dmitri V. Novikov "High-resolution X-ray diffraction and electron microscopy study of porous GaAs substrates", Proc. SPIE 8700, International Conference Micro- and Nano-Electronics 2012, 87000D (8 January 2013); https://doi.org/10.1117/12.2017023
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KEYWORDS
Gallium arsenide

Scattering

Etching

Crystals

Scanning electron microscopy

X-ray diffraction

X-rays

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