Characteristic of nickel oxide microbolometer

Gyo-hun Koo; Young-Chul Jung; Sung-Ho Hahm; Dong-Geon Jung; Yong Soo Lee

doi:10.1117/12.2015676

11 June 2013 Characteristic of nickel oxide microbolometer

Gyo-hun Koo, Young-Chul Jung, Sung-Ho Hahm, Dong-Geon Jung, Yong Soo Lee

Proceedings Volume 8704, Infrared Technology and Applications XXXIX; 87041P (2013) https://doi.org/10.1117/12.2015676
Event: SPIE Defense, Security, and Sensing, 2013, Baltimore, Maryland, United States

Abstract

Nickel oxide (NiO) film was formed on the SiO₂/Si substrate at the room temperature with water cooling system by reactive RF sputter. The feasibility of bolometric material was investigated, and a microbolometer using the NiO film was fabricated and evaluated. The NiO films were analyzed by using grazing-incidence X-ray diffraction (GIXRD). The NiO(111), NiO (200), and NiO (220) peaks expected as the main spectrum were dominantly appeared on the polycrystalline NiO films. The representative resistivity acquired at the O₂/(Ar+O₂) ratio of 10% sample was about 40.6 Ωcm. The resistivity of 40.6 Ωcm obtained in low oxygen partial pressure was inclined to reduce to 18.65 Ωcm according to the increase of the O₂/(Ar+O₂) ratio. The TCR value of fabricated microbolometer was −1.67%/℃ at the NiO film resistivity of 40.6 Ωcm. The characteristics of fabricated NiO film and microbolometer were demonstrated by XRD patterns, TCR value, and SEM image.

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Gyo-hun Koo, Young-Chul Jung, Sung-Ho Hahm, Dong-Geon Jung, and Yong Soo Lee "Characteristic of nickel oxide microbolometer", Proc. SPIE 8704, Infrared Technology and Applications XXXIX, 87041P (11 June 2013); https://doi.org/10.1117/12.2015676

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