Paper
9 July 2013 The effect of RIE-modified surface contamination on optical performance of fused silica
Laixi Sun, Hongjie Liu, Jin Huang, Xin Ye, Qiang Cheng, Xinda Zhou, Fengrui Wang, Xiaodong Jiang, Weidong Wu
Author Affiliations +
Proceedings Volume 8786, Pacific Rim Laser Damage 2013: Optical Materials for High Power Lasers; 87860P (2013) https://doi.org/10.1117/12.2020381
Event: SPIE/SIOM Pacific Rim Laser Damage: Optical Materials for High-Power Lasers, 2013, Shanghai, China
Abstract
A series of fused silica surface have been created by reaction ion etching to determine the effect of the contamination level on surface state and optical performance of the optics. The results show that both impurity elements contamination and scratches of fused silica surface can be removed dramatically during RIE process. The laser induced damage threshold is raised by 37.6% when the polishing layer is removed for a thickness of 6μm, and the laser weak absorption doesn’t increase obviously. The results can provide technique support for improving laser induced damage performance of fused silica.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Laixi Sun, Hongjie Liu, Jin Huang, Xin Ye, Qiang Cheng, Xinda Zhou, Fengrui Wang, Xiaodong Jiang, and Weidong Wu "The effect of RIE-modified surface contamination on optical performance of fused silica", Proc. SPIE 8786, Pacific Rim Laser Damage 2013: Optical Materials for High Power Lasers, 87860P (9 July 2013); https://doi.org/10.1117/12.2020381
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Cited by 2 scholarly publications.
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KEYWORDS
Contamination

Etching

Silica

Reactive ion etching

Surface finishing

Laser induced damage

Ions

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