Atom lithography with subwavelength resolution

M. Suhail Zubairy; Zeyang Liao; M. Al-Amri

doi:10.1117/12.2023234

26 September 2013 Atom lithography with subwavelength resolution

M. Suhail Zubairy, Zeyang Liao, M. Al-Amri

Proceedings Volume 8875, Quantum Communications and Quantum Imaging XI; 887504 (2013) https://doi.org/10.1117/12.2023234
Event: SPIE Optical Engineering + Applications, 2013, San Diego, California, United States

Abstract

The resolutions of the optical lithography is limited by the well-known Rayleigh limit. Although the atom lithography can generate features smaller than this limit, the spacing of the pattern is still limited by the optical wavelength. Here, we proposed two atom lithography methods, both of which used the coherent Rabi oscillation to break the diffraction limit. One is in the microwave regime where the Rydberg atom is used and micrometer resolution can be achieved. The other is in the optical regime where sub-10 nanometer resolution is possible.

Citation Download Citation

M. Suhail Zubairy, Zeyang Liao, and M. Al-Amri "Atom lithography with subwavelength resolution", Proc. SPIE 8875, Quantum Communications and Quantum Imaging XI, 887504 (26 September 2013); https://doi.org/10.1117/12.2023234

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