Paper
25 July 2013 Dynamic method of calibration and examination piezoresistive cantilevers
Andrzej Sierakowski, Daniel Kopiec, Magdalena Ekwińska, Tomasz Piasecki, Rafał Dobrowolski, Mariusz Płuska, Krzysztof Domański, Piotr Grabiec, Teodor P. Gotszalk
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Proceedings Volume 8902, Electron Technology Conference 2013; 890220 (2013) https://doi.org/10.1117/12.2031522
Event: Electron Technology Conference 2013, 2013, Ryn, Poland
Abstract
In this paper authors present two methods of determining the cantilever displacement sensitivity. In both cases the cantilevers are examined in dynamic condition for cantilever vibrating with frequency range close to resonance frequency. One of the method uses as measurement tool a white light interferometer, the another one uses the laser interferometric vibrometer. For adequate comparing methods, obtained results refer to the same cantilever with piezoresistive Wheatstone bridge. In this paper authors also present the fabrication process of piezoresistive cantilevers with planar tip adapted for working in a shear force [1]. Additionally the piezoresistive circuit characterization by impedance spectroscopy is presented. Finally the spring constant is determined basing on frequency response of the cantilever measured from thermal noise density [2]. Basing on obtained results authors made a conclusion that both methods can be successfully used for accurate characterization piazoresistive cantilevers work in a non-contact resonance mode.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrzej Sierakowski, Daniel Kopiec, Magdalena Ekwińska, Tomasz Piasecki, Rafał Dobrowolski, Mariusz Płuska, Krzysztof Domański, Piotr Grabiec, and Teodor P. Gotszalk "Dynamic method of calibration and examination piezoresistive cantilevers", Proc. SPIE 8902, Electron Technology Conference 2013, 890220 (25 July 2013); https://doi.org/10.1117/12.2031522
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KEYWORDS
Wheatstone bridges

Silicon

Calibration

Interferometers

Dielectric spectroscopy

Interferometry

Plasma etching

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