Novel fluorinated compounds that improve durability of antistick layer for quartz mold

Tsuneo Yamashita; Hisashi Mitsuhashi; Masamichi Morita; Shuso Iyoshi; Makoto Okada; Shinji Matsui

doi:10.1117/12.2044448

28 March 2014 Novel fluorinated compounds that improve durability of antistick layer for quartz mold

Tsuneo Yamashita, Hisashi Mitsuhashi, Masamichi Morita, Shuso Iyoshi, Makoto Okada, Shinji Matsui

Proceedings Volume 9049, Alternative Lithographic Technologies VI; 90491Q (2014) https://doi.org/10.1117/12.2044448
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

In recent years, the reduction in pattern size is driving the rapid adoption of nanoimprint lithography (NIL). Since nanoimprinting since is contact printing, a higher separation force might damage the master and/or the imprint tool, either of which degrades pattern quality. One of the biggest concerns in NIL utilization is the mold-release characteristic of the master and the resin. Although Optool DSX^TM (DAIKIN Ind. Ltd.) is a de facto standard as mold release reagent, there is a problem with its UV-NIL durability. Accordingly, we focused on developing new fluorinated low molecular weight perfluorocompounds to enhance the mold-release characteristic of the resist. This paper reports that resists containing these fluroinated compounds offer improved durability as antistick layers for quartz molds subjected to repeated UV-NIL exposure.

Citation Download Citation

Tsuneo Yamashita, Hisashi Mitsuhashi, Masamichi Morita, Shuso Iyoshi, Makoto Okada, and Shinji Matsui "Novel fluorinated compounds that improve durability of antistick layer for quartz mold", Proc. SPIE 9049, Alternative Lithographic Technologies VI, 90491Q (28 March 2014); https://doi.org/10.1117/12.2044448

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