Vanadium oxide thin film with improved sheet resistance uniformity

Francis Généreux; Francis Provençal; Bruno Tremblay; Marc-André Boucher; Christian Julien; Christine Alain

doi:10.1117/12.2053465

24 June 2014 Vanadium oxide thin film with improved sheet resistance uniformity

Francis Généreux, Francis Provençal, Bruno Tremblay, Marc-André Boucher, Christian Julien, Christine Alain

Proceedings Volume 9070, Infrared Technology and Applications XL; 90701R (2014) https://doi.org/10.1117/12.2053465
Event: SPIE Defense + Security, 2014, Baltimore, MD, United States

Abstract

This paper reports on the deposition of vanadium oxide thin films with sheet resistance uniformity better than 2.5% over a 150 mm wafer. The resistance uniformity within the array is estimated to be less than 1%, which is comparable with the value reported for amorphous silicon-based microbolometer arrays. In addition, this paper also shows that the resistivity of vanadium oxide, like amorphous silicon, can be modeled by Arrhenius' equation. This result is expected to significantly ease the computation of the correction table required for TEC-less operation of VO_x-based microbolometer arrays.

Citation Download Citation

Francis Généreux, Francis Provençal, Bruno Tremblay, Marc-André Boucher, Christian Julien, and Christine Alain "Vanadium oxide thin film with improved sheet resistance uniformity", Proc. SPIE 9070, Infrared Technology and Applications XL, 90701R (24 June 2014); https://doi.org/10.1117/12.2053465

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