Grazing-incidence small angle x-ray scattering studies of nanoscale polymer gratings

Manolis Doxastakis; Hyo Seon Suh; Xuanxuan Chen; Paulina A. Rincon Delgadillo; Lingshu Wan; Lance Williamson; Zhang Jiang; Joseph Strzalka; Jin Wang; Wei Chen; Nicola Ferrier; Abelardo Ramirez-Hernandez; Juan J. de Pablo; Roel Gronheid; Paul Nealey

doi:10.1117/12.2085824

19 March 2015 Grazing-incidence small angle x-ray scattering studies of nanoscale polymer gratings

Manolis Doxastakis, Hyo Seon Suh, Xuanxuan Chen, Paulina A. Rincon Delgadillo, Lingshu Wan, Lance Williamson, Zhang Jiang, Joseph Strzalka, Jin Wang, Wei Chen, Nicola Ferrier, Abelardo Ramirez-Hernandez, Juan J. de Pablo, Roel Gronheid, Paul Nealey

Author Affiliations +

Proceedings Volume 9424, Metrology, Inspection, and Process Control for Microlithography XXIX; 94241N (2015) https://doi.org/10.1117/12.2085824
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

Grazing-Incidence Small Angle X-ray Scattering (GISAXS) offers the ability to probe large sample areas, providing three-dimensional structural information at high detail in a thin film geometry. In this study we exploit the application of GISAXS to structures formed at one step of the LiNe (Liu-Nealey) flow using chemical patterns for directed self-assembly of block copolymer films. Experiments conducted at the Argonne National Laboratory provided scattering patterns probing film characteristics at both parallel and normal directions to the surface. We demonstrate the application of new computational methods to construct models based on scattering measured. Such analysis allows for extraction of structural characteristics at unprecedented detail.

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Manolis Doxastakis, Hyo Seon Suh, Xuanxuan Chen, Paulina A. Rincon Delgadillo, Lingshu Wan, Lance Williamson, Zhang Jiang, Joseph Strzalka, Jin Wang, Wei Chen, Nicola Ferrier, Abelardo Ramirez-Hernandez, Juan J. de Pablo, Roel Gronheid, and Paul Nealey "Grazing-incidence small angle x-ray scattering studies of nanoscale polymer gratings", Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94241N (19 March 2015); https://doi.org/10.1117/12.2085824

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