Photonic structures in photoresist and PDMS surface patterned by AFM lithography

J. Ďurišová; S. Slabeyciusová; D. Pudiš; D. Jandura

doi:10.1117/12.2181900

5 May 2015 Photonic structures in photoresist and PDMS surface patterned by AFM lithography

J. Ďurišová, S. Slabeyciusová, D. Pudiš, D. Jandura

Proceedings Volume 9502, Metamaterials X; 950211 (2015) https://doi.org/10.1117/12.2181900
Event: SPIE Optics + Optoelectronics, 2015, Prague, Czech Republic

Abstract

This contribution demonstrates surface modification of thin photoresist layers and polydimethylsiloxane (PDMS) surfaces with spatial resolution better than 20 nm. We provided few different 2D arrangements of surface patterning with aim to prepare 2D photonic structures with various symmetries in the thin S1828 photoresist layer using AFM lithography. Consequently, we used the imprinting technique for transferring the photoresist pattern to the PDMS membrane surface. Finally, prepared 2D photonic structures in photoresist and PDMS surfaces are characterized by AFM.

Citation Download Citation

J. Ďurišová, S. Slabeyciusová, D. Pudiš, and D. Jandura "Photonic structures in photoresist and PDMS surface patterned by AFM lithography", Proc. SPIE 9502, Metamaterials X, 950211 (5 May 2015); https://doi.org/10.1117/12.2181900

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available