Laser induced damage of SiO2 and CaF2 under 263 nm

Xiuqing Jiang; Dong Liu; Lailin Ji; Shunxing Tang; Yajing Guo; Baoqiang Zhu; Yanqi Gao; Zunqi Lin

doi:10.1117/12.2186012

14 July 2015 Laser-induced damage of SiO₂ and CaF₂ under 263 nm

Xiuqing Jiang, Dong Liu, Lailin Ji, Shunxing Tang, Yajing Guo, Baoqiang Zhu, Yanqi Gao, Zunqi Lin

Proceedings Volume 9532, Pacific Rim Laser Damage 2015: Optical Materials for High-Power Lasers; 95320C (2015) https://doi.org/10.1117/12.2186012
Event: Pacific Rim Laser Damage, 2015, Jiading, Shanghai, China

Abstract

Laser damage performance of large aperture optical components has been study under fourth harmonic of 1053nm Nd:glass laser irradiation (263nm).The threshold of optical components is very low under 263nm laser irradiation ,due to conversion of beam to higher energy photons of the quadrupled frequency (4ω), and is relative to material characteristic. A preliminary test of laser induced damage in fused silica (SiO₂) and CaF₂under 263nm laser is reported in this article. Thresholds of these two materials are obtained. Laser damage threshold of SiO₂ is found about 2 J/cm² by 1-on-1 method using pulsed 263nm laser, lower than CaF₂ whose threshold.

Citation Download Citation

Xiuqing Jiang, Dong Liu, Lailin Ji, Shunxing Tang, Yajing Guo, Baoqiang Zhu, Yanqi Gao, and Zunqi Lin "Laser-induced damage of SiO₂ and CaF₂ under 263 nm", Proc. SPIE 9532, Pacific Rim Laser Damage 2015: Optical Materials for High-Power Lasers, 95320C (14 July 2015); https://doi.org/10.1117/12.2186012

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