Key indexes of the effectiveness of mask surface treatments

Chen-Yang Lin; Chung-Hsuan Liu; Kuan-Wen Lin; Chi-Lun Lu; Luke Hsu; Angus Chin; Anthony Yen

doi:10.1117/12.2197675

18 December 2015 Key indexes of the effectiveness of mask surface treatments

Chen-Yang Lin, Chung-Hsuan Liu, Kuan-Wen Lin, Chi-Lun Lu, Luke Hsu, Angus Chin, Anthony Yen

Proceedings Volume 9635, Photomask Technology 2015; 963519 (2015) https://doi.org/10.1117/12.2197675
Event: SPIE Photomask Technology, 2015, Monterey, California, United States

Abstract

A proper surface treatment, such as O2 plasma, helps to improve particle removal efficiency (PRE) because of the formation of hydrogen bonding between particles, water and the mask surface after treatment. The effectiveness of surface treatments cannot be determined only by the static wettability after processes. More key indexes should be considered. In this paper, we report our findings on the relationship between surface treatments on photomasks and the resulting wettability. In addition, added defects after the treatment and the cleaning process were inspected with a 193- nm KLA inspector on 193-nm immersion and EUV photomasks, which consist of SiO₂, MoSi, Cr, Ta-based absorber and Ru. Based on our work, three indexes can be built for determining the effectiveness of surface treatments. The first is to check whether the surface becomes super-hydrophilic after treatment. The second is to determine the efficiency of surface treatments on enhancing wettability. The last is to quantify the added watermark count after the surface treatment and the cleaning process. With a proper surface treatment, watermarks can be greatly eased. These three indexes can quickly determine possible effective methods for treating the surfaces of different materials.

Citation Download Citation

Chen-Yang Lin, Chung-Hsuan Liu, Kuan-Wen Lin, Chi-Lun Lu, Luke Hsu, Angus Chin, and Anthony Yen "Key indexes of the effectiveness of mask surface treatments", Proc. SPIE 9635, Photomask Technology 2015, 963519 (18 December 2015); https://doi.org/10.1117/12.2197675

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KEYWORDS

Chromium

Ruthenium

Digital watermarking

Particles

Plasma

Photomasks

Oxygen

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