The next generation of maskless lithography

Steffen Diez

doi:10.1117/12.2211052

15 March 2016 The next generation of maskless lithography

Steffen Diez

Proceedings Volume 9761, Emerging Digital Micromirror Device Based Systems and Applications VIII; 976102 (2016) https://doi.org/10.1117/12.2211052
Event: SPIE OPTO, 2016, San Francisco, California, United States

Abstract

The essential goal for fast prototyping of microstructures is to reduce the cycle time. Conventional methods up to now consist of creating designs with a CAD software, then fabricating or purchasing a Photomask and finally using a mask aligner to transfer the pattern to the photoresist. The new Maskless Aligner (MLA) enables to expose the pattern directly without fabricating a mask, which results in a significantly shorter prototyping cycle. To achieve this short prototyping cycle, the MLA has been improved in many aspects compared to other direct write lithography solutions: exposure speed, user interface, ease of operation and flexibility.

Citation Download Citation

Steffen Diez "The next generation of maskless lithography", Proc. SPIE 9761, Emerging Digital Micromirror Device Based Systems and Applications VIII, 976102 (15 March 2016); https://doi.org/10.1117/12.2211052

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