DSA materials contributions to the defectivity performance of 14nm half-pitch LiNe flow at IMEC

Hari Pathangi; Varun Vaid; Boon Teik Chan; Nadia Vandenbroeck; Jin Li; Sung Eun Hong; Yi Cao; Baskaran Durairaj; Guanyang Lin; Mark Somervell; Takahiro Kitano; Ryota Harukawa; Kaushik Sah; Andrew Cross; Hareen Bayana; Lucia D’Urzo; Roel Gronheid

doi:10.1117/12.2219936

22 March 2016 DSA materials contributions to the defectivity performance of 14nm half-pitch LiNe flow at IMEC

Hari Pathangi, Varun Vaid, Boon Teik Chan, Nadia Vandenbroeck, Jin Li, Sung Eun Hong, Yi Cao, Baskaran Durairaj, Guanyang Lin, Mark Somervell, Takahiro Kitano, Ryota Harukawa, Kaushik Sah, Andrew Cross, Hareen Bayana, Lucia D’Urzo, Roel Gronheid

Author Affiliations +

Proceedings Volume 9777, Alternative Lithographic Technologies VIII; 97770G (2016) https://doi.org/10.1117/12.2219936
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

This manuscript shows the relationship between defectivity of a typical chemo-epitaxy sequence and the DSA-specific materials, namely the mat, the brush and the block co-polymer. We demonstrate that the density of assembly defects in a line-space DSA flow, namely the dislocations and 1-period bridges have a direct correlation to certain parameters in the synthesis sequence of these materials. The primary focus of this manuscript is on identifying, controlling and reproducing the defects-critical parameters in the block co-polymer synthesis process for a stable and low defect performance of DSA flows.

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Hari Pathangi, Varun Vaid, Boon Teik Chan, Nadia Vandenbroeck, Jin Li, Sung Eun Hong, Yi Cao, Baskaran Durairaj, Guanyang Lin, Mark Somervell, Takahiro Kitano, Ryota Harukawa, Kaushik Sah, Andrew Cross, Hareen Bayana, Lucia D’Urzo, and Roel Gronheid "DSA materials contributions to the defectivity performance of 14nm half-pitch LiNe flow at IMEC", Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 97770G (22 March 2016); https://doi.org/10.1117/12.2219936

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