High speed AFM studies of 193 nm immersion photoresists during TMAH development

Johnpeter Ngunjiri; Greg Meyers; Jim Cameron; Yasuhiro Suzuki; Hyun Jeon; Dave Lee; Kwang Mo Choi; Jung Woo Kim; Kwang-Hwyi Im; Hae-Jin Lim

doi:10.1117/12.2218956

21 March 2016 High speed AFM studies of 193 nm immersion photoresists during TMAH development

Johnpeter Ngunjiri, Greg Meyers, Jim Cameron, Yasuhiro Suzuki, Hyun Jeon, Dave Lee, Kwang Mo Choi, Jung Woo Kim, Kwang-Hwyi Im, Hae-Jin Lim

Author Affiliations +

Proceedings Volume 9779, Advances in Patterning Materials and Processes XXXIII; 97790W (2016) https://doi.org/10.1117/12.2218956
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

In this paper we report on our studies of the dynamic process of resist development in real time. Using High Speed – Atomic Force Microscopy (HS-AFM) in dilute developer solution, changes in morphology and nanomechanical properties of patterned resist were monitored. The Bruker Dimension FastScan AFM^TM was applied to analyze 193 nm acrylic-based immersion resists in developer. HS-AFM operated in Peak Force mapping mode allowed for concurrent measurements of image topography resist stiffness, adhesion to AFM probe and deformation during development. In our studies we focused on HS-AFM topography data as it readily revealed detailed information about initial resist morphology, followed by a resist swelling process and eventual dissolution of the exposed resist areas. HS-AFM showed potential for tracking and understanding development of patterned resist films and can be useful in evaluating the dissolution properties of different resist designs.

Citation Download Citation

Johnpeter Ngunjiri, Greg Meyers, Jim Cameron, Yasuhiro Suzuki, Hyun Jeon, Dave Lee, Kwang Mo Choi, Jung Woo Kim, Kwang-Hwyi Im, and Hae-Jin Lim "High speed AFM studies of 193 nm immersion photoresists during TMAH development", Proc. SPIE 9779, Advances in Patterning Materials and Processes XXXIII, 97790W (21 March 2016); https://doi.org/10.1117/12.2218956

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