EBL2: high power EUV exposure facility

Edwin te Sligte; Norbert Koster; Freek Molkenboer; Peter van der Walle; Pim Muilwijk; Wouter Mulckhuyse; Bastiaan Oostdijck; Christiaan Hollemans; Björn Nijland; Peter Kerkhof; Michel van Putten; André Hoogstrate; Alex Deutz

doi:10.1117/12.2240921

5 October 2016 EBL2: high power EUV exposure facility

Edwin te Sligte, Norbert Koster, Freek Molkenboer, Peter van der Walle, Pim Muilwijk, Wouter Mulckhuyse, Bastiaan Oostdijck, Christiaan Hollemans, Björn Nijland, Peter Kerkhof, Michel van Putten, André Hoogstrate, Alex Deutz

Author Affiliations +

Proceedings Volume 9985, Photomask Technology 2016; 998520 (2016) https://doi.org/10.1117/12.2240921
Event: SPIE Photomask Technology, 2016, San Jose, California, United States

Abstract

TNO is building EBL2: a laboratory EUV exposure system capable of operating at high broad band EUV powers and intensities, in which XPS analysis of exposed samples is possible without breaking vacuum. Its goal is to accelerate the development and testing of EUV optics and components by providing a publicly accessible exposure and analysis facility. The system can accept a range of sample sizes, including standard EUV reticles with or without pellicles. In the beam line, EUV masks and other samples can be exposed to EUV radiation in a controlled environment that is representative of actual operating conditions. This contribution will describe the design of the EUV beam line.

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Edwin te Sligte, Norbert Koster, Freek Molkenboer, Peter van der Walle, Pim Muilwijk, Wouter Mulckhuyse, Bastiaan Oostdijck, Christiaan Hollemans, Björn Nijland, Peter Kerkhof, Michel van Putten, André Hoogstrate, and Alex Deutz "EBL2: high power EUV exposure facility", Proc. SPIE 9985, Photomask Technology 2016, 998520 (5 October 2016); https://doi.org/10.1117/12.2240921

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