Poster + Presentation
5 March 2022 Wavelength and pulse duration influence on laser 3D nanolithography
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Conference Poster
Abstract
Laser 3D nanolithography as an additive manufacturing technology allows the fabrication of various objects at a micro-scale, with possible nano-scale single features. An absorption mechanism plays the key role, thus polymerization reaction starts only at a certain value of light intensity I, which also alters because of possible different non-linearities of light-matter interaction when different wavelengths are used. Both polymerization and optical damage thresholds and the feature size depend on the applied I and energy dose E. In this work, the experiment was performed within the 700-1250 nm wavelength range while varying pulse duration (~ 100-300 fs). We present how the polymerization process (thresholds and feature sizes) depends on both wavelength and pulse duration in the SZ2080TM prepolymer.
Conference Presentation
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Edvinas Skliutas, Danielius Samsonas, Laura Sebestinaitė, Salvijus Ulevicius, Vytautas Jukna, Donatas Narbutis, Mikas Vengris, and Mangirdas Malinauskas "Wavelength and pulse duration influence on laser 3D nanolithography", Proc. SPIE PC12012, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XV, PC120120V (5 March 2022); https://doi.org/10.1117/12.2606034
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KEYWORDS
Nanolithography

Polymerization

Pulsed laser operation

Absorption

Lithography

Additive manufacturing

Laser damage threshold

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