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11 November 2022 Material-specific high-resolution extreme ultraviolet microscopy using a high-order harmonic source
Wilhelm Eschen, Lars Loetgering, Vittoria Schuster, Robert Klas, Alexander Kirsche, Lutz Berthold, Michael Steinert, Thomas Pertsch, Michael Krause, Jens Limpert, Jan Rothhardt
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Proceedings Volume PC12292, International Conference on Extreme Ultraviolet Lithography 2022; PC122920O (2022) https://doi.org/10.1117/12.2641705
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States
Abstract
In this contribution, we present a scanning coherent diffractive imaging (i.e. ptychography) microscope operating in the EUV. Coherent EUV radiation at 13.5 nm is generated by high-order harmonic generation using a high-power fiber laser system. Utilizing structured illumination, a highly stable EUV source and ptychography setup sub 20 nm half-pitch resolution is demonstrated on a resolution test chart. Moreover, the lamella of an integrated structure is investigated and its contained materials are identified using the measured quantitative amplitude and phase.
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Wilhelm Eschen, Lars Loetgering, Vittoria Schuster, Robert Klas, Alexander Kirsche, Lutz Berthold, Michael Steinert, Thomas Pertsch, Michael Krause, Jens Limpert, and Jan Rothhardt "Material-specific high-resolution extreme ultraviolet microscopy using a high-order harmonic source", Proc. SPIE PC12292, International Conference on Extreme Ultraviolet Lithography 2022, PC122920O (11 November 2022); https://doi.org/10.1117/12.2641705
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KEYWORDS
Extreme ultraviolet
Microscopy
Metrology
Microscopes
Refractive index
Scattering
Silica
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