Market prospects for multibeam mask writers

Franklin D. Kalk

doi:10.1117/12.3012068

10 April 2024 Market prospects for multibeam mask writers

Franklin D. Kalk

Proceedings Volume PC12956, Novel Patterning Technologies 2024; PC1295604 (2024) https://doi.org/10.1117/12.3012068
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

Over the past decade, multiple electron beam photomask writers (MBWs) have been developed and reduced to manufacturing practice. The initial use was at the leading edge (especially for EUV masks), where complex features with low line edge roughness demand flexible patterning and high dose resists. MBWs’ utility can extend beyond leading edge masks, however, from more relaxed design rules to novel applications. This talk will survey the mask writer market from both historical and predictive perspectives. The technological and commercial factors will be tied to what, how, how many, and where mask writers are deployed. The main thesis of the talk is that MBWs’ unique attributes can redefine the electron beam mask writer market and allow them to play principal role in a wide range of applications.

Conference Presentation

Citation Download Citation

Franklin D. Kalk "Market prospects for multibeam mask writers", Proc. SPIE PC12956, Novel Patterning Technologies 2024, PC1295604 (10 April 2024); https://doi.org/10.1117/12.3012068

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