Scaling up thermal scanning probe lithography with the NanoFrazor: avenues for parallelization and automation

Jana Chaaban; Fabian Könemann; Simon Bonnani; Kartik Buddha; Emine Cagin

doi:10.1117/12.3009852

10 April 2024 Scaling up thermal scanning probe lithography with the NanoFrazor: avenues for parallelization and automation

Jana Chaaban, Fabian Könemann, Simon Bonnani, Kartik Buddha, Emine Cagin

Author Affiliations +

Proceedings Volume PC12956, Novel Patterning Technologies 2024; PC129560L (2024) https://doi.org/10.1117/12.3009852
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

The NanoFrazor employs thermal scanning probe lithography (tSPL) and direct laser sublimation to pattern and inspect nanoscale structures. This technology addresses complex nanodevice fabrication challenges by enabling markerless overlay, sub-nanometer precise 3D grayscale lithography, and integration into inert atmospheres for sensitive materials. Automation of NanoFrazor lithography is a natural progression, improving reliability, repeatability, and usability. Scripting and unprecedented patterning endurance allow for automated, markerless overlay of diverse features, benefiting applications requiring precise feature placement on pre-existing structures, like nanopillars on micro-posts or defined channels in FinFET devices. The upcoming multi-tip version of the NanoFrazor, the Decapede, enhances tSPL scalability without sacrificing resolution, enabling uninterrupted large-area patterning with parallelized tips and improved reproducibility. Use-cases demonstrate multi-tip patterning and the integration of 47 grating couplers onto silicon waveguides, creating unique nanophotonic devices. These advancements pave the way for scaled-up automated tSPL in More-than-Moore applications.

Conference Presentation

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Jana Chaaban, Fabian Könemann, Simon Bonnani, Kartik Buddha, and Emine Cagin "Scaling up thermal scanning probe lithography with the NanoFrazor: avenues for parallelization and automation", Proc. SPIE PC12956, Novel Patterning Technologies 2024, PC129560L (10 April 2024); https://doi.org/10.1117/12.3009852

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KEYWORDS

Automation

Optical lithography

Scanning probe lithography

Lithography

Nanostructures

Fabrication

Overlay metrology

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